- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/42 - Alignment or registration features, e.g. alignment marks on the mask substrates
Patent holdings for IPC class G03F 1/42
Total number of patents in this class: 305
10-year publication summary
|
24
|
23
|
16
|
26
|
38
|
37
|
34
|
33
|
32
|
8
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
55 |
| ASML Netherlands B.V. | 6816 |
22 |
| Boe Technology Group Co., Ltd. | 35384 |
21 |
| Changxin Memory Technologies, Inc. | 4732 |
15 |
| Kioxia Corporation | 9847 |
15 |
| Hoya Corporation | 2822 |
14 |
| Samsung Electronics Co., Ltd. | 131630 |
10 |
| Canon Inc. | 36841 |
7 |
| Nikon Corporation | 7162 |
7 |
| Samsung Display Co., Ltd. | 30585 |
6 |
| Applied Materials, Inc. | 16587 |
6 |
| Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8635 |
6 |
| Nanya Technology Corporation | 2000 |
5 |
| Ordos Yuansheng Optoelectronics Co., Ltd. | 1232 |
5 |
| V Technology Co., Ltd. | 394 |
5 |
| Texas Instruments Incorporated | 19376 |
3 |
| Tokyo Electron Limited | 11599 |
3 |
| SK Hynix Inc. | 11030 |
3 |
| Carl Zeiss SMT GmbH | 2646 |
3 |
| Beijing BOE Display Technology Co., Ltd. | 2497 |
3 |
| Other owners | 91 |